 This is a ICP/RIE etch tool used for a large number of etch processes, including Si, SiO2, Si3N4, Ge, etc... Fluorinated and hydrogenated gases are used. Current processes inculde SF6, CF4, C4F8, H2, CH4, Ar and O2. |
This is a ICP/RIE etch tool used for a large number of etch processes, including Si, SiO2, Si3N4, Ge, etc... Fluorinated and hydrogenated gases are used. Current processes inculde SF6, CF4, C4F8, H2, CH4, Ar and O2. |