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Prof. Andrew Sarangan
Nano-Fab Lab: Semiconductor Device Fabrication
+1 937-229-3190
sarangan@udayton.edu
University of Dayton
Thin Films
RF/DC Sputter
E-beam Evaporator
PECVD
Etching
ICP/RIE
RIE/O2
Wet Etch
Lithography
Contact Mask Aligner
DUV Laser Lithography
Spin Coater
Spray Developer
Photochemicals
Substrate Prep
Vapor Prime/Image Reversal
Megasonic Cleaner
UV Ozone
Thermal
Rapid Thermal
Diffusion/Oxidation Furnace
Contact Bake
Convection Oven
RT Hotplates
Muffle Furnace
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Wafer Bonder
Wire Bonder
Thinning/Polishing
Microfluidics
Metrology
Surface Profiler
Atomic Force Microscope
SEM Library
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Compound Microscope
Horizontal Microscope
Probe Station
4-Point Probe
IR Spectroscopy
Chemicals
Photoresists
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Acids
Wet Etchants
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DI Water Tester
Thermocouple Welder
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Laser Interference Lithography
Silicon Nanowires (MACE)
Optical Waveguide Sensors
Nanostructured Thin Films
Metal-Dielectric Thin Films
Fourier Multispectral Filters
Phase Change Materials (VO2)
Phase Change Materials (GST)
Silicon Infrared Photodetectors
Laser Assisted Chemical Etching (LASE)
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RT Hotplates
Documents
These conventional hot plates are used for baking photoresist films.
